Tandem Van de Graaff Accelerator
High Voltage Engineering Corporation 6-MV model EN tandem Van de Graaff accelerator at Western Michigan University has been in continuous use for more than 50 years and has been continually upgraded to remain state of the art. Our accelerator facility is an important component in graduate and undergraduate education and in faculty research that receives external grant support.
Current photos of accelerator facility
A priority on education
The WMU accelerator facility devotes significant beam time to education, offering hands-on experiences for our undergraduate and graduate students.
Students in the third semester of the sophomore-level calculus-based physics sequence use the accelerator in three-hour atomic and nuclear collision (e.g., Rutherford scattering) experiments. Upper-level undergraduate physics majors and graduate students use the facility in advanced laboratory courses. In addition, students are given independent study opportunities that allow them to design and conduct small research projects using the accelerator under close faculty supervision.
We continually make the accelerator laboratory available to users outside the Department of Physics. It has been the site for many undergraduate WMU Lee Honors College thesis research projects, independent study projects, and high school science mentorship projects overseen by the Kalamazoo Area Mathematics and Science Center.
Additionally, students from many high schools and colleges come to the university on a regular basis to use the accelerator to conduct collision experiments as part of the physics curricula at their home institutions.
Enabling basic research
Department of Physics faculty use the accelerator for basic research in atomic, condensed matter, nuclear, nuclear astrophysics, and applied physics. Their work has resulted in numerous publications in leading journals.
The accelerator has also been used to conduct the research reported in numerous dissertations and thesis projects of our doctoral and master’s students.
Available for practical applications
Accelerators can be used in a wide array of practical applications. Low-energy ions in a variety of charge states and species, as well as secondary gamma rays, can probe materials, alter crystal structure, or test detectors and electronics. Several such applications have been developed in our lab, and our team is receptive to developing others to meet specific needs.
Accelerator Specifications
Primary Accelerator
- Type: 6 MV Tandem Van de Graaff
- Maximum Terminal Voltage: 6 MV
- Ion Sources:
- SNICS II cesium sputter ion source (for light and heavy negative ions)
- RF exchange Gas ion source (for light-ion beams such as He)
- Available Beams: H, D, He, and other light ions (depending on source material and configuration)
- Energy Range:
- Up to ~12 MeV for protons (depending on charge state and operating conditions)
- Scalable energies for other light ions
- Beamlines: Multiple beamlines configured for scattering experiments, ion-beam analysis, charged-particle spectroscopy, and irradiation studies
- Typical Beam Currents: From low nA (precision analysis mode) to higher currents for irradiation studies
- Vacuum System: High-vacuum beam transport and target chambers suitable for thin films, bulk materials, and specialized sample environments
Low-Energy Direct Ion Implantation System
- Energy Range: 20–70 keV (direct beam from ion source)
- Application: Low-energy ion implantation and surface modification
- Beam Intensity: Varies with ion species and beam energy
- Use Cases:
- Shallow implantation profiles
- Surface engineering and modification
- Thin-film doping
- Materials research requiring controlled low-energy implantation
Analytical and Experimental Capabilities
- Rutherford Backscattering Spectrometry (RBS)
- Elastic Recoil Detection (ERD)
- Nuclear Reaction Analysis (NRA)
- Charged-Particle Spectroscopy
- Ion Irradiation and Radiation Damage Studies
- Low-Energy Ion Implantation (20–70 keV)
Target handling supports thin films, bulk samples, and substrates up to approximately 1 inch in diameter (larger geometries possible depending on configuration).
Services for Academia and Industry
The WMU Accelerator Facility supports both academic research and industrial applications, including:
Ion-Beam Analysis (IBA):
- Thin-film thickness measurements (areal density determination)
- Elemental composition and impurity analysis
- Depth profiling
- Interface characterization
Ion Irradiation Studies:
- Radiation damage testing
- Materials modification
- Detector and semiconductor testing
- Coating and surface performance evaluation
Low-Energy Ion Implantation:
- Controlled shallow doping
- Surface modification
- Thin-film engineering
The facility has collaborated with universities, national laboratories, and private industry on materials science, nuclear physics, semiconductor research, and applied irradiation projects.
Beam Time and Rates
Beam time for external academic and industrial users is available subject to technical feasibility and scheduling.
- Rates are negotiated on a case-by-case basis, depending on:
- Type of experiment (analysis, irradiation, or implantation)
- Beam time required
- Technical complexity
- Personnel and data analysis support
Collaborative research arrangements and fee-for-service projects are both welcome.
For inquiries, please contact: Professor Asghar Kayani